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DichIorosilane-SiH2Cl2

summary

Name:DichIorosilane Chemical common name： Formula:SiH2Cl2 Categories:Deposition Subclasses:Deposition Specifications:3N-4N: Storage methods:DOT steel bottle

Description

Description	Dichlorosilane at normal temperature and pressure with a pungent suffocating odor and corrosive colorless poisonous gas. Inflammable air above 44 ℃ can be spontaneous, to generate hydrogen chloride and silicon oxide combustion oxidation. When heated to above 100 ℃ will disassemble and generate hydrogen chloride, chlorine, hydrogen and silicon uncertainty. Will disassemble when subjected to strong shocks. Corrosive fumes in moist air. Hydrochloric acid and water hydrolysis of polysiloxane (SiH2O) 4. Soluble in benzene, ether and carbon tetrachloride. With a base, ethanol, acetone from the reaction. Even a small amount of halogen or other oxidants contact also occurs violent reaction. With a trialkyl amine, pyridine addition compound is formed. Reaction with antimony trifluoride fluorosilane.
Usage
Precautions	Intense stimulation inhaled respiratory tract, causing coughing, respiratory irritation, laryngospasm and pulmonary edema. Touching the eyes can cause watery eyes and cause eye burns. Skin contact can cause chemical burns.
By Industry	Chemical industry

1, 3 butadiene, pure hydrogen and high purity oxygen, nitrogen, argon, hydrogen, nitrogen dioxide, trimethyl bromide boron TMB, silane and silane mix other gas, hydrogen, nitrogen trifluoride selenide, boron trifluoride, liquid ammonia, etching gas, electronic gas, six fluoride oxide, hydrogen sulfide, and methane, high pure butane, high purity isobutane methane, high purity, high purity, high purity propane butane, high-purity propylene and isobutylene, butadiene, ethane, butene, anti - 2 - butene, propylene, propiolic, vinyl acetylene, ethyl acetylene, carbonyl sulfur, allene, sulfur hexafluoride, new pentane, carbon tetrafluoride, eight fluorine cyclobutane, nitric oxide, high purity nitrous oxide (n2o), hydrogen chloride, high purity helium, ultrapure, ultra pure nitrogen, pure argon and helium gas standard.Trimethyl gallium, trimethyl indium gallium, trimethyl aluminum, triethyl, triethyl indium, diethyl zinc, zinc dimethyl, dicyclopentadienyl magnesium source (MO)

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